Emission pattern of an aluminium nitride target for radio frequency magnetron sputtering
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چکیده
منابع مشابه
Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering
TaN thin film is an attractive interlayer as well as a diffusion barrier layer in [FeN/TaN]n multilayers for the application as potential write-head materials in high-density magnetic recording. We synthesized two series of TaN films on glass and Si substrates by using reactive radio-frequency sputtering under 5-mtorr Ar/N2 processing pressure with varied N2 partial pressure, and carried out sy...
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Silicon nitride and silicon nitride-based ceramics have several favorable material properties, such as high hardness and good wear resistance, which makes them important materials for the coating industry. This thesis focuses the synthesis of silicon nitride, silicon oxynitride, and silicon carbonitride thin films by reactive magnetron sputtering. The films were characterized based on their che...
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متن کامل
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ژورنال
عنوان ژورنال: Journal of Physics: Conference Series
سال: 2011
ISSN: 1742-6596
DOI: 10.1088/1742-6596/274/1/012116